Please use this identifier to cite or link to this item: http://hdl.handle.net/20.500.12779/5420
Title: SILICON NITRIDE AND OXYNITRIDE DEPOSITED FROM ORGANOSILICON PLASMAS:ToF-SIMSCHARACTERIZATION WITH MULTIVARIATE ANALYSIS
Authors: PIRAS F., M
DI MUNDO, R
Fracassi, F
Magnani, Agnese 
Keywords: Plasma enhanced chemical vapour deposition (PECVD); Silicon nitride and oxynitride; Bis(dimethylamino)dimethylsilane; Surface chemistry; TOF-SIMS; Multivariate analysis
Issue Date: 2008
Project: None 
Journal: SURFACE & COATINGS TECHNOLOGY
Description: 
19928
URI: http://hdl.handle.net/20.500.12779/5420
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2007.07.016
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